Elektrodeposisi Lapisan TiO2 Untuk Aplikasi Lapisan Self Cleaning

Authors

  • Agus Rozani Jurusan Fisika FMIPA Universitas Andalas
  • Dahlan Dahyunir Jurusan Fisika FMIPA Universitas Andalas

DOI:

https://doi.org/10.25077/jfu.5.3.244-247.2016

Abstract

Lapisan TiO2 telah disintesis pada substrat besi yang terlapisi Nikel dan Kromium menggunakan prekursor TiCl3.  Lapisan TiO2 disintesis dengan metode elektrodeposisi pada tegangan 3 V dan 4 V, dengan variasi kosentrasi TiCl3 0,1 hingga 1 M.  Pola XRD menunjukkan bahwa lapisan TiO2 yang terbentuk berfasa anatase.  Hasil SEM menunjukkan bahwa elektrodeposisi dengan TiCl3 0,4 M pada tegangan 3 V menghasilkan morfologi lapisan tipis TiO2 yang lebih merata dibandingkan dengan sampel-sampel yang lainnya.  Hasil pendeposisian lapisan pada tegangan 4 V menghasilkan lapisan yang berwarna hitam.  Dari pengukuran sudut kontak  diketahui bahwa sampel bersifat hidrofobik dengan sudut kontak di atas 90°.  Sampel dengan kosentrasi TiCl3 0,4 M dan tegangan 3 V memiliki lapisan TiO2 yang memiliki sifat self cleaning terbaik dengan sudut kontak rata-rata 104,3°.

Kata kunci : Lapisan TiO2, sudut kontak, self cleaning

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Published

2016-07-03

Issue

Vol. 5 No. 3 (2016)

Section

Articles

License

Copyright (c) 2016 Agus Rozani, Dahlan Dahyunir

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