Fabrikasi dan Karakterisasi Film Tipis ZnO Terhadap Arus Deposisi Menggunakan Metode Elektroplating

Authors

  • Romantina Hutajulu Universitas Negeri Medan
  • Jubaidah Jubaidah Physics Department, Faculty of Mathematics and Natural Sciences https://orcid.org/0000-0002-9877-6813
  • Nurdin Siregar Physics Department, Faculty of Mathematics and Natural Sciences

DOI:

https://doi.org/10.25077/jfu.13.3.445-451.2024

Keywords:

Film Tipis ZnO, Arus Deposisi, Elektroplating, XRD, SEM-EDX, UV-Vis

Abstract

Seng oksida (ZnO) merupakan material semikonduktor tipe-n yang banyak dikembangkan untuk berbagai aplikasi salah satunya adalah sel surya. ZnO biasanya dibuat dalam bentuk film tipis. Film tipis ZnO telah berhasil disintesis menggunakan metode elektroplating dengan variasi arus deposisi (7, 10, 25, dan 35 mA). Sampel film tipis ZnO diuji menggunakan XRD, SEM-EDX, dan UV-Vis untuk mengetahui struktur, morfologi, dan sifat optiknya. Hasil analisis difraktogram XRD menunjukkan struktur kristal untuk semua sampel adalah Wurtzite Hexagonal dan ukuran kristalit 18,1-28,0 nm dengan puncak tertinggi dihasilkan bidang Miller (200). Analisis morfologi menunjukkan bahwa semakin tinggi arus deposisi, semakin seragam bentuk partikel kristalit dan semakin merata menutupi permukaan substrat. Hasil UV-Vis menunjukkan nilai transmitansi film tipis ZnO untuk semua sampel > 80% dan lebar celah pita energi film tipis ZnO berkisar antara 3,41-3,47 eV sehingga dapat diaplikasikan pada sel surya.

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Published

2024-05-03

How to Cite

Hutajulu, R., Jubaidah, J., & Siregar, N. (2024). Fabrikasi dan Karakterisasi Film Tipis ZnO Terhadap Arus Deposisi Menggunakan Metode Elektroplating. Jurnal Fisika Unand, 13(3), 445–451. https://doi.org/10.25077/jfu.13.3.445-451.2024

Issue

Vol. 13 No. 3 (2024)

Section

Articles

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